Effect of plasma gases on insulating properties of low-temperature-deposited SiOCH films prepared by remote plasma-enhanced chemical vapor deposition

• Keisuke Yamaoka

• Naomichi Okada

• Yuji Yoshizako

書誌事項

タイトル別名

• Effect of plasma gases on insulating properties of low temperature deposited SiOCH films prepared by remote plasma enhanced chemical vapor deposition
• Special issue: Solid state devices and materials
• Special issue Solid state devices and materials

収録刊行物

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (4B), 1997-2000, 2007-04

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

キーワード

• silicon oxide
• low temperature
• plasma-enhanced chemical vapor deposition
• PECVD
• tetraethylorthosilicate
• TEOS
• tetraethoxysilane
• insulating properties

詳細情報

• CRID: 1520572357058749568
• NII論文ID: 40015348976
• NII書誌ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.46.1997
• NDL書誌ID: 8718588
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8718588
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.1997
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.1997/pdf
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • Crossref
  • CiNii Articles