Microcrystalline/amorphous thin Si films deposition by a newly developed dual injection system employing hydrogen plasma and silicon radicals at low temperature (300℃) chemical vapor deposition process

• Toru Takeda

• Kouji Tanaka

• Hirotada Inoue

書誌事項

タイトル別名

• Microcrystalline amorphous thin Si films deposition by a newly developed dual injection system employing hydrogen plasma and silicon radicals at low temperature 300ドC chemical vapor deposition process
• Special issue: Solid state devices and materials
• Special issue Solid state devices and materials

収録刊行物

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (4B), 2542-2553, 2007-04

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

キーワード

• microwave plasma
• low temperature deposition
• microcrystalline silicon
• amorphous silicon

詳細情報

• CRID: 1520572358058337792
• NII論文ID: 40015349095
• NII書誌ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.46.2542
• NDL書誌ID: 8720381
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8720381
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.2542
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.2542/pdf
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • Crossref
  • CiNii Articles