Single-component chemically amplified resist based on dehalogenation of polymer

• Hiroki Yamamoto

• Takahiro Kozawa

• Seiichi Tagawa

Bibliographic Information

Other Title

• Single component chemically amplified resist based on dehalogenation of polymer

Journal

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 46 (25-28), L648-650, 2007-07

  Tokyo : Japan Society of Applied Physics

Keywords

• EUV lithography
• electron beam lithography
• chemically amplified resist
• single component
• dehalogenation

Details

• CRID: 1520573330784542464
• NII Article ID: 40015511976
• NII Book ID: AA11906093
• ISSN: 00214922
• NDL BIB ID: 8835390
• Web Site: http://id.ndl.go.jp/bib/8835390
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8835390
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles