Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high-frequency plasma-enhanced chemical vapor deposition

• Shinsuke Miyajima

• Makoto Sawamura

• Akira Yamada

書誌事項

タイトル別名

• Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high frequency plasma enhanced chemical vapor deposition

収録刊行物

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 46 (25-28), L693-695, 2007-07

  Tokyo : Japan Society of Applied Physics

キーワード

• VHF-PECVD
• nanocrystalline material
• silicon carbide
• low-temperature deposition
• solar cell

詳細情報

• CRID: 1522262179791954304
• NII論文ID: 40015511990
• NII書誌ID: AA11906093
• ISSN: 00214922
• NDL書誌ID: 8835656
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8835656
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles