Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high-frequency plasma-enhanced chemical vapor deposition

• Shinsuke Miyajima

• Makoto Sawamura

• Akira Yamada

Bibliographic Information

Other Title

• Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high frequency plasma enhanced chemical vapor deposition

Journal

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 46 (25-28), L693-695, 2007-07

  Tokyo : Japan Society of Applied Physics

Keywords

• VHF-PECVD
• nanocrystalline material
• silicon carbide
• low-temperature deposition
• solar cell

Details

• CRID: 1522262179791954304
• NII Article ID: 40015511990
• NII Book ID: AA11906093
• ISSN: 00214922
• NDL BIB ID: 8835656
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8835656
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles