Epitaxy in Fe3Si/FeSi2 superlattices prepared by facing target direct-current sputtering at room temperature

• Kaoru Takeda

• Tsuyoshi Yoshitake

• Dai Nakagauchi

Bibliographic Information

Other Title

• Epitaxy in Fe3Si FeSi2 superlattices prepared by facing target direct current sputtering at room temperature

Abstract

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Journal

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (12), 7846-7848, 2007-12

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

Keywords

• FeSi2
• Fe3Si
• superlattice
• epitaxial growth
• interlayer coupling
• TEM
• XRD

Details

• CRID: 1520853832122454656
• NII Article ID: 40015752589
• NII Book ID: AA10457675
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.46.7846
• NDL BIB ID: 9299305
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9299305
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.7846
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.7846/pdf
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles