Crystal orientation of epitaxial α-Ta(110) thin films grown on Si(100) and Si(111) substrates by sputtering

• Masahiro Kudo

• Satoko Shinkai

• Hideto Yanagisawa

Bibliographic Information

Other Title

• Crystal orientation of epitaxial アルファ Ta 110 thin films grown on Si 100 and Si 111 substrates by sputtering

Abstract

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Journal

• Japanese journal of applied physics : JJAP

  Japanese journal of applied physics : JJAP 47 (7), 5608-5612, 2008-07

  Tokyo : The Japan Society of Applied Physics

Keywords

• epitaxial growth
• crystal orientation
• α-Tafilm
• conventional dc magnetron sputtering
• X-ray pole figure analysis
• XRD

Details

• CRID: 1520853833973845376
• NII Article ID: 40016161803
• NII Book ID: AA12295836
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.47.5608
• NDL BIB ID: 9585983
• Web Site: http://id.ndl.go.jp/bib/9585983
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9585983
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.47.5608
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.47.5608/pdf
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles