Boron-doped microcrystalline silicon oxide film for use as back surface field in cast polycrystalline silicon solar cells

• Amornrat Limmanee

• Tsutomu Sugiura

• Hiroshi Yamamoto

Bibliographic Information

Other Title

• Boron doped microcrystalline silicon oxide film for use as back surface field in cast polycrystalline silicon solar cells

Abstract

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Journal

• Japanese journal of applied physics : JJAP

  Japanese journal of applied physics : JJAP 47 (12), 8796-8798, 2008-12

  Tokyo : The Japan Society of Applied Physics

Keywords

• back surface field
• boron-doped Si films
• passivation
• silicon solar cell

Details

• CRID: 1520853833071512192
• NII Article ID: 40016389605
• NII Book ID: AA12295836
• ISSN: 00214922
• ISSN: 13474065
• ISSN: http://id.crossref.org/issn/13474065
• DOI: 10.1143/jjap.47.8796
• NDL BIB ID: 9743021
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9743021
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.47.8796
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.47.8796/pdf
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles