High-pressure water vapor heat treatment for enhancement of SiOx or SiNx passivation layers of silicon solar cells

• Akiyoshi Ogane

• Athapol Kitiyanan

• Yukiharu Uraoka

Bibliographic Information

Other Title

• High pressure water vapor heat treatment for enhancement of SiOx or SiNx passivation layers of silicon solar cells

Abstract

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Journal

• Japanese journal of applied physics : JJAP

  Japanese journal of applied physics : JJAP 48 (6), 066504-, 2009-06

  Tokyo : The Japan Society of Applied Physics

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1520009407871623424
• NII Article ID: 40016627211
• NII Book ID: AA12295836
• ISSN: 00214922
• ISSN: 13474065
• DOI: 10.1143/jjap.48.066504
• NDL BIB ID: 10260711
• Web Site: http://id.ndl.go.jp/bib/10260711
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I10260711
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.48.066504
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.48.066504/pdf
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles