Study on synchrotron radiation induced photo etching of perfluorinated polymers by K-edge absorption of F-atom

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Journal

  • Journal of photopolymer science and technology

    Journal of photopolymer science and technology 23(3), 381-386, 2010

    Technical Association of Photopolymers, Japan

Codes

  • NII Article ID (NAID)
    40017173790
  • NII NACSIS-CAT ID (NCID)
    AA11576862
  • Text Lang
    ENG
  • ISSN
    09149244
  • NDL Article ID
    10735949
  • NDL Source Classification
    ZP48(科学技術--印写工学)
  • NDL Call No.
    Z53-W515
  • Data Source
    NDL 
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