Effects of annealing and atomic hydrogen treatment on aluminum oxide passivation layers for crystalline silicon solar cells

• Junpei Irikawa

• Shinsuke Miyajima

• Shuhei Kida

Journal

• Japanese journal of applied physics : JJAP

  Japanese journal of applied physics : JJAP 50 (1), 012301-, 2011-01

  Tokyo : The Japan Society of Applied Physics

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1520572358292676480
• NII Article ID: 40017446822
• NII Book ID: AA12295836
• ISSN: 00214922
• ISSN: 13474065
• ISSN: http://id.crossref.org/issn/13474065
• DOI: 10.7567/jjap.50.012301
• NDL BIB ID: 10948889
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I10948889
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles