Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser

• Kazumasa Okamoto

• Takahiro Kozawa

• Keita Oikawa

Journal

• Applied physics express : APEX

  Applied physics express : APEX 5 (9), 2012-09

  Tokyo : Japan Society of Applied Physics

Details

• CRID: 1523951030763634816
• NII Article ID: 40019425422
• NII Book ID: AA12295133
• ISSN: 18820778
• NDL BIB ID: 023966838
• Web Site: http://id.ndl.go.jp/bib/023966838
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I023966838
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles