Progress in Deposition Technology of Magnetic Tunnel Junctions

• TSUNEKAWA Koji

  Process Development Center, Canon ANELVA Corporation

Bibliographic Information

Other Title

• 磁気トンネル接合の成膜技術の進展
• ジキ トンネル セツゴウ ノ セイマク ギジュツ ノ シンテン

Abstract

  Magnetic tunnel junctions (MTJs) have already been used for electronics devices such as magnetic read-heads of hard-disk drives and magnetic random memories. As the performance of such devices advances year by year, the requirements for the MTJs are getting strict. In order to fulfill such strict requirements, stack structure and deposition process of the MTJs have also been improved. This article focuses on the magnetic read-heads and the magnetic random access memories, and describes the technical trend of MTJs and progress in sputtering deposition technology.<br>

Journal

• Journal of the Vacuum Society of Japan

  Journal of the Vacuum Society of Japan 57 (3), 91-95, 2014

  The Vacuum Society of Japan

Keywords

• Spectroscopy
• Surfaces and Interfaces
• Instrumentation
• General Materials Science

Details

• CRID: 1390001205295084288
• NII Article ID: 130003394507
• NII Article ID: 40020014785
• NII Book ID: AA12298652
• DOI: 10.3131/jvsj2.57.91
• BIBCODE: 2014JVSJ...57...91T
• ISSN: 18824749
• ISSN: 18822398
• NDL BIB ID: 025338667
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025338667
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed