Growth of CdTe and Hg[x]Cd[1-x]Te films by hot-wall epitaxy and its characterization ホットウォールエピタキシー法によるCdTe及びHg[x]Cd[1-x]Te薄膜の成長及び評価

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Author

    • 立岡, 浩一 タツオカ, ヒロカズ

Bibliographic Information

Title

Growth of CdTe and Hg[x]Cd[1-x]Te films by hot-wall epitaxy and its characterization

Other Title

ホットウォールエピタキシー法によるCdTe及びHg[x]Cd[1-x]Te薄膜の成長及び評価

Author

立岡, 浩一

Author(Another name)

タツオカ, ヒロカズ

University

静岡大学

Types of degree

工学博士

Grant ID

乙第41号

Degree year

1992-02-20

Note and Description

博士論文

Table of Contents

  1. Abstract / p1 (0003.jp2)
  2. Contents / (0004.jp2)
  3. 1.Introduction / p1 (0005.jp2)
  4. References / p3 (0006.jp2)
  5. 2. Growth of CdTe(100)and(111)B films on GaAs(100)substrates / p5 (0007.jp2)
  6. 2-1. Introduction / p5 (0007.jp2)
  7. 2-2. Sample preparation / p6 (0008.jp2)
  8. 2-3. Characterization of CdTe(100)films on GaAs(100)substrates / p9 (0009.jp2)
  9. 2-4. Characterization of CdTe(111)B films on GaAs(100)substrates / p19 (0014.jp2)
  10. 2-5. Conclusion / p27 (0018.jp2)
  11. References / p29 (0019.jp2)
  12. 3. Growth of CdTe(111)B films on sapphire(0001)substrates / p30 (0020.jp2)
  13. 3-1. Introduction / p30 (0020.jp2)
  14. 3-2. Growth procedure / p30 (0020.jp2)
  15. 3-3. Characterization of CdTe(111)B films on sapphire(0001)substrates / p30 (0020.jp2)
  16. 3-4. Conclusion / p36 (0023.jp2)
  17. References / p36 (0023.jp2)
  18. 4. Growth of CdTe homoepitaxial films / p38 (0024.jp2)
  19. 4-1. Introduction / p38 (0024.jp2)
  20. 4-2. Experimental procedure / p38 (0024.jp2)
  21. 4-3. Characterization of CdTe homoepitaxial films / p38 (0024.jp2)
  22. 4-4. Conclusion / p47 (0028.jp2)
  23. References / p47 (0028.jp2)
  24. 5. Growth of HgTe and [化学式] films / p48 (0029.jp2)
  25. 5-1. Introduction / p48 (0029.jp2)
  26. 5-2. Growth procedure / p48 (0029.jp2)
  27. 5-3. Characterization of HgTe films / p49 (0029.jp2)
  28. 5-4. Characterization of [化学式] films / p51 (0030.jp2)
  29. 5-5. Conclusion / p53 (0031.jp2)
  30. References / p53 (0031.jp2)
  31. 6.Strain relaxation / p54 (0032.jp2)
  32. 6-1.Introduction / p54 (0032.jp2)
  33. 6-2.Summary of the strain relaxation for CdTe(100)/GaAs(100) / p55 (0032.jp2)
  34. 6-3.Strain relaxation model / p59 (0034.jp2)
  35. 6-4.Application to other systems / p61 (0035.jp2)
  36. 6-5.Conclusion / p63 (0036.jp2)
  37. References / p63 (0036.jp2)
  38. 7.Summary / p65 (0037.jp2)
  39. Acknowledgments / p67 (0038.jp2)
  40. Appendix A Deformation of crystalline lattices / p68 (0039.jp2)
  41. B Shift of energy bands under strain / p70 (0040.jp2)
  42. C Deformation of films using Bimetal model / p73 (0041.jp2)
  43. References / p75 (0042.jp2)
  44. Addendum / p76 (0043.jp2)
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Codes

  • NII Article ID (NAID)
    500000082259
  • NII Author ID (NRID)
    • 8000000082467
  • DOI(NDL)
  • NDLBibID
    • 000000246573
  • Source
    • NDL ONLINE
    • NDL Digital Collections

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