Fundamental study of GaInAs/GaInAsP/InP quantum-wire lasers GaInAs/GaInAsP/InP量子細線レーザの基礎研究
この論文にアクセスする
この論文をさがす
著者
書誌事項
- タイトル
-
Fundamental study of GaInAs/GaInAsP/InP quantum-wire lasers
- タイトル別名
-
GaInAs/GaInAsP/InP量子細線レーザの基礎研究
- 著者名
-
三宅, 康也
- 著者別名
-
ミヤケ, ヤスナリ
- 学位授与大学
-
東京工業大学
- 取得学位
-
博士 (工学)
- 学位授与番号
-
甲第2607号
- 学位授与年月日
-
1993-03-26
注記・抄録
博士論文
目次
- 論文目録 / (0001.jp2)
- Contents / p1 (0007.jp2)
- Chapter1 Introduction / p1 (0010.jp2)
- 1.1 Introduction / p1 (0010.jp2)
- 1.2 Semiconductor Laser as a Device / p3 (0012.jp2)
- 1.3 Quantum-Well Laser / p3 (0012.jp2)
- 1.4 Quantum-Wire and Quantum-Box Lasers / p5 (0014.jp2)
- 1.5 Purpose and Contents of This Thesis / p7 (0016.jp2)
- References / p13 (0022.jp2)
- Chapter2 Theoretical Background / p19 (0028.jp2)
- 2.1 Introduction / p19 (0028.jp2)
- 2.2 Gain and Linewidth Enhancement Factor α / p20 (0029.jp2)
- 2.3 Threshold Current Density of Quantum-Wire Laser / p24 (0033.jp2)
- 2.4 Strained Quantum-Wire Laser / p30 (0039.jp2)
- 2.5 Conclusion / p40 (0049.jp2)
- References / p41 (0050.jp2)
- Chapter3 Quanturn-Film laser by LP-OMVPE / p45 (0054.jp2)
- 3.1 Introduction / p45 (0054.jp2)
- 3.2 GaInAs/GaInAsP Growth by LP-OMVPE / p46 (0055.jp2)
- 3.3 Quantum-Film Laser / p56 (0065.jp2)
- 3.4 Conclusion / p61 (0070.jp2)
- References / p62 (0071.jp2)
- Chapter4 Improvements in Fabrication Process for Quantum-Wire Lasers / p66 (0075.jp2)
- 4.1 Introduction / p66 (0075.jp2)
- 4.2 Improvement of Regrowth Interface / p68 (0077.jp2)
- 4.3 Hole Injection Efficiency / p76 (0085.jp2)
- 4.4 Conclusion / p84 (0093.jp2)
- References / p85 (0094.jp2)
- Chapter5 Room Temperature Operation of Quantum-Wire Lasers / p87 (0096.jp2)
- 5.1 Introduction / p87 (0096.jp2)
- 5.2 Fabrication / p89 (0098.jp2)
- 5.3 Measurement / p94 (0103.jp2)
- 5.4 Strained MQF Laser with Wire Like Active Region / p97 (0106.jp2)
- 5.5 Conclusion / p103 (0112.jp2)
- References / p104 (0113.jp2)
- Chapter6 Dry Etching Process by ECR-RIBE / p108 (0117.jp2)
- 6.1 Introduction / p108 (0117.jp2)
- 6.2 ECR-RIBE System / p109 (0118.jp2)
- 6.3 Etching Condition for MQW Structure / p112 (0121.jp2)
- 6.4 Room Temperature Operation of MQF-Wire Laser by ECR-RIBE / p114 (0123.jp2)
- 6.5 Conclusion / p115 (0124.jp2)
- References / p118 (0127.jp2)
- Chapter7 Conclusion / p122 (0131.jp2)
- Acknowledgements / p124 (0133.jp2)
- Publication List / p127 (0136.jp2)