Optical properties and molecular orbital analyses of defects in photo-CVD SiO[2] thin films 光CDV SiO[2]膜中欠陥の光学的性質および分子軌道法による評価
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Bibliographic Information
- Title
-
Optical properties and molecular orbital analyses of defects in photo-CVD SiO[2] thin films
- Other Title
-
光CDV SiO[2]膜中欠陥の光学的性質および分子軌道法による評価
- Author
-
金島, 岳
- Author(Another name)
-
カナシマ, タケシ
- University
-
大阪大学
- Types of degree
-
博士 (工学)
- Grant ID
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甲第5631号
- Degree year
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1996-03-25
Note and Description
博士論文
Table of Contents
- Abstract / p1 (0003.jp2)
- Contents / p3 (0004.jp2)
- 1 Introduction / p1 (0005.jp2)
- 1.1 Background / p1 (0005.jp2)
- 1.2 Purpose of This Work / p3 (0006.jp2)
- Reference / p7 (0008.jp2)
- 2 Preparation of Photo-CVD SiO₂ Thin Film / p9 (0009.jp2)
- 2.1 Introduction / p9 (0009.jp2)
- 2.2 Preparation Method of SiO₂ Thin Film / p9 (0009.jp2)
- 2.3 Basic Properties of SiO₂ Thin Film / p12 (0011.jp2)
- Reference / p15 (0012.jp2)
- 3 Optical Absorption of SiO₂ Film / p17 (0013.jp2)
- 3.1 Introduction / p17 (0013.jp2)
- 3.2 Measurement Method of Absorption Spectra / p18 (0014.jp2)
- 3.3 Growth Condition Dependence / p19 (0014.jp2)
- 3.4 Annealing Effect / p23 (0016.jp2)
- 3.5 High Pressure Oxygen Treatment / p24 (0017.jp2)
- Reference / p26 (0018.jp2)
- 4 Photoluminescence of SiO₂ Thin Film / p27 (0018.jp2)
- 4.1 Introduction / p27 (0018.jp2)
- 4.2 Measurement Method of Photoluminescence / p27 (0018.jp2)
- 4.3 Photoluminescence Excited by Deuterium Lamp / p29 (0019.jp2)
- 4.4 Photoluminescence Excited by ArF Excimer Laser / p36 (0023.jp2)
- 4.5 Photoluminescence Excited by F₂ Excimer Laser / p41 (0025.jp2)
- 4.6 Photoluminescence Excited by N₂ Laser / p46 (0028.jp2)
- Reference / p48 (0029.jp2)
- 5 Excimer Laser Irradiation Effect / p51 (0030.jp2)
- 5.1 Introduction / p51 (0030.jp2)
- 5.2 Measurement Method of Irradiation Effect / p51 (0030.jp2)
- 5.3 Optical Absorption / p52 (0031.jp2)
- 5.4 Photoluminescence / p54 (0032.jp2)
- 5.5 Electron Spin Resonance / p56 (0033.jp2)
- Reference / p62 (0036.jp2)
- 6 Defect Energy Analyses by Molecular Orbital Method / p63 (0036.jp2)
- 6.1 Introduction / p63 (0036.jp2)
- 6.2 Calculation Method / p64 (0037.jp2)
- 6.3 SiO₂ Cluster / p64 (0037.jp2)
- 6.4 Oxygen-Excess Defect / p66 (0038.jp2)
- 6.5 Hydrogen-Related Defects / p74 (0042.jp2)
- 6.6 Si-Si Defect / p83 (0046.jp2)
- Reference / p87 (0048.jp2)
- 7 Conclusion / p89 (0049.jp2)
- A Molecular Orbital Method / p91 (0050.jp2)
- A.1 Introduction / p91 (0050.jp2)
- A.2 Schrödinger Equation / p91 (0050.jp2)
- A.3 Hartree-Fock Theory / p92 (0051.jp2)
- A.4 Ab-Initio Method / p94 (0052.jp2)
- A.5 Semi-Empirical Method / p95 (0052.jp2)
- Reference / p96 (0053.jp2)
- Vita / p97 (0053.jp2)
- Publications / p98 (0054.jp2)
