Chemical vapor deposition of SiO[2] and (Ba,Sr)TiO[3] films and their application to electronic devices CVD法によるSiO[2]及び (Ba,Sr)TiO[3]薄膜の形成と電子デバイスへの応用
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Bibliographic Information
- Title
-
Chemical vapor deposition of SiO[2] and (Ba,Sr)TiO[3] films and their application to electronic devices
- Other Title
-
CVD法によるSiO[2]及び (Ba,Sr)TiO[3]薄膜の形成と電子デバイスへの応用
- Author
-
川原, 孝昭
- Author(Another name)
-
カワハラ, タカアキ
- University
-
東京大学
- Types of degree
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博士 (工学)
- Grant ID
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乙第13294号
- Degree year
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1997-03-17
Note and Description
博士論文
Table of Contents
- 要旨 / p5 (0006.jp2)
- CONTENTS / (0008.jp2)
- 1.Introduction / p1 (0009.jp2)
- 1.1 Chemical vapor deposition of SiO₂ films / p5 (0011.jp2)
- 1.2 Chemical vapor deposition of(Ba,Sr)TiO₃ films / p11 (0014.jp2)
- 1.3 Scope of the present study / p17 (0017.jp2)
- References / p19 (0018.jp2)
- 2.Chemical Vapor Deposition of SiO₂ Films / p21 (0019.jp2)
- 2.1 Deposition process and film characteristics / p21 (0019.jp2)
- 2.2 Deposition mechanism / p32 (0025.jp2)
- 2.3 Application to electronic devices / p54 (0036.jp2)
- 2.4 Discussion / p66 (0043.jp2)
- References / p69 (0045.jp2)
- 3.Chemical Vapor Deposition of(Ba,Sr)TiO₃ Films / p71 (0046.jp2)
- 3.1 Deposition process and film characteristics / p71 (0046.jp2)
- 3.2 Deposition mechanism / p107 (0064.jp2)
- 3.3 Application to electronic devices / p112 (0067.jp2)
- 3.4 Discussion / p121 (0071.jp2)
- References / p125 (0073.jp2)
- 4.General Discussion / p127 (0074.jp2)
- 5.Summary and Conclusions / p131 (0076.jp2)
- Acknowledgments / p133 (0077.jp2)
- List of Publications / p134 (0078.jp2)