Isothermal vapor phase epitaxy and characterization of high quality Hg[1-x](Cd[1-y]Zn[y])[x]Te 高品位Hg[1-x](Cd[1-y]Zn[y])[x]Teの等温気相エピタキシーと特性評価
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Bibliographic Information
- Title
-
Isothermal vapor phase epitaxy and characterization of high quality Hg[1-x](Cd[1-y]Zn[y])[x]Te
- Other Title
-
高品位Hg[1-x](Cd[1-y]Zn[y])[x]Teの等温気相エピタキシーと特性評価
- Author
-
具, 本欣
- Author(Another name)
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クー, ボンフン
- University
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東北大学
- Types of degree
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博士 (工学)
- Grant ID
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乙第7619号
- Degree year
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1998-12-09
Note and Description
博士論文
Table of Contents
- Contents / p1 (0003.jp2)
- Chapter1 Introduction / p1 (0008.jp2)
- 1.1 Necessity of High Quality MCZT Epilayers / p1 (0008.jp2)
- 1.2 Substrates for MCZT Epilayers / p4 (0011.jp2)
- 1.3 Present State and Problems on the ISOVPE Growth of MCZT Epilayers / p10 (0017.jp2)
- 1.4 Objectives and Outline of this Thesis / p14 (0021.jp2)
- References for Chapter1 / p19 (0026.jp2)
- Chapter2 Experimental Method / p24 (0031.jp2)
- 2.1 Isothermal Vapor Phase Epitaxy(ISOVPE) / p24 (0031.jp2)
- 2.2 Preparation of Source and Substrate Materials / p27 (0034.jp2)
- 2.3 Hot Wall Epitaxy(HWE) / p34 (0041.jp2)
- 2.4 Characterization of Grown Epilayers / p36 (0043.jp2)
- References for Chapter2 / p47 (0054.jp2)
- Chapter3 Growth Kinetics of Hg₁₋χCdχTe Epilayers on Bulk(110)CdTe by Semiclosed Open-Tube Isothermal Vapor Phase Epitaxy / p48 (0055.jp2)
- 3.1 Introduction / p48 (0055.jp2)
- 3.2 Weight Loss of HgTe Reservoir / p49 (0056.jp2)
- 3.3 Effect of Growth Parameters on the Surface Composition(χ)and Thickness / p51 (0058.jp2)
- 3.4 Growth Rate Constant / p56 (0063.jp2)
- 3.5.Interdiffusion Coefficient / p59 (0066.jp2)
- 3.6 Conclusions / p66 (0073.jp2)
- References for Chapter3 / p67 (0074.jp2)
- Chapter4 Effect of Lattice Match and Zn Addition on the Properties of [化学式] Epilayers / p69 (0076.jp2)
- 4.1 Introduction / p69 (0076.jp2)
- 4.2 Comparison of MCT and MCZT Composition Profile on Cleaved Cross-Section / p70 (0077.jp2)
- 4.3 Effect of Source Composition / p73 (0080.jp2)
- 4.4 Uniformity of MCZT Epilayers / p75 (0082.jp2)
- 4.5 Comparison of Properties between MCT and MCZT / p78 (0085.jp2)
- 4.6 Origin of Excellent Crystallinity of MCZT/CZT Epilayers / p82 (0089.jp2)
- 4.7 Conclusions / p86 (0093.jp2)
- References for Chapter4 / p87 (0094.jp2)
- Chapter5 Hot Wall Epitaxy and Evaluation of High Quality[化学式](y=0 and 0.045) Epilayers on(100)GaAs / p89 (0096.jp2)
- 5.1 Introduction / p89 (0096.jp2)
- 5.2 Determination of Optimum Growth Conditions / p91 (0098.jp2)
- 5.3 Discussion on the Growth Rate and Composition(y) / p112 (0119.jp2)
- 5.4 Relation between Quality and Epilayer Thickness / p122 (0129.jp2)
- 5.5 Conclusions / p132 (0139.jp2)
- References for Chapter5 / p134 (0141.jp2)
- Chapter6 Isothermal Vapor Phase Epitaxy of [化学式] on(100)[化学式]/GaAs Substrates / p137 (0144.jp2)
- 6.1 Introduction / p137 (0144.jp2)
- 6.2 Effect of CdTe Substrate Layer Thickness on ISOVPE Growth of MCT Epilayers / p138 (0145.jp2)
- 6.3 Formation Mechanism of Triangular Voids / p142 (0149.jp2)
- 6.4 Effect of the Substrate Layer Thickness on Quality of MCT and MCZT Epilayers / p145 (0152.jp2)
- 6.5 Comparison of Crystallinity between MCT/CdTe/GaAs and MCZT/CZT/GaAs / p148 (0155.jp2)
- 6.6 Conclusions / p150 (0157.jp2)
- References for Chapter6 / p152 (0159.jp2)
- Chapter7 Conclusions / p154 (0161.jp2)
- Acknowledgements / p159 (0166.jp2)