Studies on fabrication of low-dielectric-constant siloxane film by plasma processes
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Bibliographic Information
- Title
-
Studies on fabrication of low-dielectric-constant siloxane film by plasma processes
- Author
-
藤井, 俊明
- Author(Another name)
-
フジイ, トシアキ
- University
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名城大学
- Types of degree
-
博士(工学)
- Grant ID
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甲第35号
- Degree year
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1999-03-18
Note and Description
博士論文
Table of Contents
- CONTENTS / p1 (0003.jp2)
- CHAPTER 1.INTRODUCTION / p1 (0004.jp2)
- 1.1 Technology of Multilevel Interconnection for ULSI Devices / p1 (0004.jp2)
- 1.2 Materials Possessing Siloxane Structures / p8 (0008.jp2)
- 1.3 Problems of Previous Studies on Fabrication of Low-Dielectric-Constant Film / p11 (0009.jp2)
- 1.4 Purpose and Composition of This Thesis / p17 (0012.jp2)
- REFERENCES FOR CHAPTER 1 / p23 (0015.jp2)
- CHAPTER 2.DEVELOPMENT OF NEW TECHNIQUE FOR FORMATION OF POLYSILOXANE FILM USING CO₂ LASER EVAPORATION ASSISTED BY REMOTE RADICAL SOURCE / p29 (0018.jp2)
- 2.1 Introduction / p29 (0018.jp2)
- 2.2 New System Using CO₂ Laser Evaporation Assisted by Remote Radical Source / p30 (0019.jp2)
- 2.3 Results and Discussion / p32 (0020.jp2)
- 2.4 Summary / p52 (0030.jp2)
- REFERENCES FOR CHAPTER 2 / p53 (0030.jp2)
- CHAPTER 3.FORMATION OF LOW-DIELECTRIC-CONSTANT FILM FROM LASER-EVAPORATED SILOXANE WITH OXYGEN RADICAL INJECTION / p55 (0031.jp2)
- 3.1 Introduction / p55 (0031.jp2)
- 3.2 Experimental / p56 (0032.jp2)
- 3.3 Results and Discussion / p60 (0034.jp2)
- 3.4 Summary / p69 (0038.jp2)
- REFERENCES FOR CHAPTER 3 / p70 (0039.jp2)
- CHAPTER 4.FORMATION OF LOW-DIELECTRIC-CONSTANT FILM BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION EMPLOYING HEXAMETHYLDISILOXANE / p71 (0039.jp2)
- 4.1 Introduction / p71 (0039.jp2)
- 4.2 Experimental / p72 (0040.jp2)
- 4.3 Results and Discussion / p74 (0041.jp2)
- 4.4 Summary / p97 (0052.jp2)
- REFERENCES FOR CHAPTER 4 / p98 (0053.jp2)
- CHAPTER 5.CONCLUSIONS / p99 (0053.jp2)
- 5.1 Summary of This Study / p99 (0053.jp2)
- 5.2 Scope for Future Research / p103 (0055.jp2)
- ACKNOWLEDGEMENTS / p107 (0057.jp2)
- LIST OF PAPERS CONCERNED WITH THIS DISSERTATION / p111 (0059.jp2)
- 1.Original Papers / p111 (0059.jp2)
- 2.International Conferences / p112 (0060.jp2)