Studies on low temperature polycrystalline silicon film formation using electron cyclotron resonance silane/hydrogen plasma ECRシラン/水素プラズマを用いた多結晶シリコン低温形成に関する研究
この論文にアクセスする
この論文をさがす
著者
書誌事項
- タイトル
-
Studies on low temperature polycrystalline silicon film formation using electron cyclotron resonance silane/hydrogen plasma
- タイトル別名
-
ECRシラン/水素プラズマを用いた多結晶シリコン低温形成に関する研究
- 著者名
-
野澤, 陵一
- 著者別名
-
ノザワ, リョウイチ
- 学位授与大学
-
名古屋大学
- 取得学位
-
博士(工学)
- 学位授与番号
-
甲第4287号
- 学位授与年月日
-
1999-03-25
注記・抄録
博士論文
目次
- Contents / p1 (0003.jp2)
- Chapter1 Introduction / p1 (0004.jp2)
- 1.1 Applications of microcrystalline silicon and polycrystalline silicon films to electronic devices / p1 (0004.jp2)
- 1.2 Previous studies on formation techniques and formation mechanisms of microcrystalline silicon and polycrystalline silicon films / p6 (0007.jp2)
- 1.3 Purpose and composition of this thesis / p11 (0009.jp2)
- References for Chapter1 / p13 (0010.jp2)
- Chapter2 Experimental setup,methods of analyses of film structures and plasma diagnostics / p16 (0012.jp2)
- 2.1 Electron cyclotron resonance silane/hydrogen plasma system / p16 (0012.jp2)
- 2.2 Methods for analyzing film structure / p16 (0012.jp2)
- 2.3 Methods of plasma diagnostics / p20 (0014.jp2)
- 2.4 Methods of in-situ observation of surface reaction / p26 (0017.jp2)
- References for Chapter2 / p31 (0019.jp2)
- Chapter3 Ion bombardment effects on crystallinity of silicon films / p32 (0020.jp2)
- 3.1 Introduction / p32 (0020.jp2)
- 3.2 Experimental setup / p33 (0020.jp2)
- 3.3 Formation of polycrystalline silicon films on crystalline silicon substrates / p34 (0021.jp2)
- 3.4 Summary / p54 (0031.jp2)
- References for Chapter3 / p55 (0031.jp2)
- Chapter4 Low temperature polycrystalline silicon film formation on insulating substrates / p56 (0032.jp2)
- 4.1 Introduction / p56 (0032.jp2)
- 4.2 Experimental setup / p57 (0032.jp2)
- 4.3 Formation of polycrystalline silicon films on quartz substrates with and without charged species / p59 (0033.jp2)
- 4.4 Formation of polycrystalline silicon films on plastic substrates without charged species / p77 (0042.jp2)
- 4.5 Summary / p77 (0042.jp2)
- References for Chapter4 / p79 (0043.jp2)
- Chapter5 In-situ observation of hydrogenated amorphous silicon surfaces during the electron cyclotron resonance hydrogen plasma annealing for the formation of polycrystalline silicon films / p80 (0044.jp2)
- 5.1 Introduction / p80 (0044.jp2)
- 5.2 Experimental setup and preparation of the sample / p82 (0045.jp2)
- 5.3 In-situ observation of surface reaction during electron cyclotron resonance hydrogen plasma annealing / p84 (0046.jp2)
- 5.4 Summary / p93 (0050.jp2)
- References for Chapter5 / p95 (0051.jp2)
- Chapter6 Conclusions / p96 (0052.jp2)
- 6.1 Summary of this study / p96 (0052.jp2)
- 6.2 Scope for the future research / p98 (0053.jp2)
- Acknowledgements / p100 (0054.jp2)
- List of papers concerned with this thesis / p101 (0054.jp2)
