AFM lithography and its application to Ⅱ-Ⅵ compound nanostructures AFMリソグラフィとⅡ-Ⅵ族化合物ナノ構造への応用に関する研究

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著者

    • Avramescu Adrian Stefan アブラメスク アドリアン ステファン

書誌事項

タイトル

AFM lithography and its application to Ⅱ-Ⅵ compound nanostructures

タイトル別名

AFMリソグラフィとⅡ-Ⅵ族化合物ナノ構造への応用に関する研究

著者名

Avramescu Adrian Stefan

著者別名

アブラメスク アドリアン ステファン

学位授与大学

北海道大学

取得学位

博士 (工学)

学位授与番号

甲第5134号

学位授与年月日

2000-03-24

注記・抄録

博士論文

目次

  1. Contents / p5 (0006.jp2)
  2. Abstract / p2 (0003.jp2)
  3. Acknowledgements / p4 (0005.jp2)
  4. 1.Introduction / p1 (0009.jp2)
  5. 1.1 Introductory Note / p1 (0009.jp2)
  6. 1.2 Historical Background / p1 (0009.jp2)
  7. 1.3 Objective of the Present Work / p8 (0016.jp2)
  8. 1.4 Synopsis of Each Chapter / p10 (0018.jp2)
  9. References / p11 (0019.jp2)
  10. 2.AFM Lithography / p14 (0022.jp2)
  11. 2.1 Introduction / p14 (0022.jp2)
  12. 2.2 The Atomic Force Microscope / p15 (0023.jp2)
  13. 2.3 AFM Lithography by Mechanical Patterning on PMMA/SiO₂/GaAs Surfaces / p18 (0026.jp2)
  14. 2.4 AFM/SEM Combined Lithography on GaAs Surfaces / p33 (0041.jp2)
  15. 2.5 Comparison Between the Mechanical and Electrical-Field Based AFM Patterning Techniques / p63 (0071.jp2)
  16. 2.6 Summary / p64 (0072.jp2)
  17. References / p65 (0073.jp2)
  18. 3.Design of II-VI Materials for Bandgap Engineering and Low-Temperature Selective Area Growth / p67 (0075.jp2)
  19. 3.1 Introduction / p67 (0075.jp2)
  20. 3.2 Growth Method / p68 (0076.jp2)
  21. 3.3 Why II-VI compound semiconductors / p72 (0080.jp2)
  22. 3.4 New S-based II-VI Compounds for Selective Area Growth / p75 (0083.jp2)
  23. 3.5 Summary / p92 (0100.jp2)
  24. References / p93 (0101.jp2)
  25. 4.Nanoscale Selective Area Growth of II-VI Compounds / p95 (0103.jp2)
  26. 4.1 Introduction / p95 (0103.jp2)
  27. 4.2 Nucleation Issue in the Nanoscale Area Selective Growth of II-VI Compounds on GaAs Substrates / p95 (0103.jp2)
  28. 4.3 Applications of Nanoscale Selective Area Growth / p101 (0109.jp2)
  29. 4.4 Summary / p104 (0112.jp2)
  30. References / p104 (0112.jp2)
  31. 5.Summary and Conclusions / p106 (0114.jp2)
  32. 5.1 Summary / p106 (0114.jp2)
  33. 5.2 Future Applications / p107 (0115.jp2)
  34. 5.3 Conclusions / p109 (0117.jp2)
  35. Apppendixes / p110 (0118.jp2)
  36. Appendix1 Sample program for mechanical AFM patterning / p110 (0118.jp2)
  37. Appendix2 Mathematica progrma for calculating the water meniscus / p111 (0119.jp2)
  38. Appendix3 Sample progrma for electric-field AFM patterning / p112 (0120.jp2)
  39. Appendix4 The properties of the electrical connection to the AFM tip for bias application between the tip and the sample / p113 (0121.jp2)
  40. Appendix5 Electron Microprobe Analysis. / p115 (0123.jp2)
  41. Appendix6 Mathematica code for fitting the bandgap energy od the ZnMgCdSalloy. / p117 (0125.jp2)
  42. Appendix7 Estimation of the heterostructure band offsets / p119 (0127.jp2)
  43. List of publications / p124 (0132.jp2)
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各種コード

  • NII論文ID(NAID)
    500000189577
  • NII著者ID(NRID)
    • 8000000189860
  • DOI(NDL)
  • NDL書誌ID
    • 000000353891
  • データ提供元
    • NDL ONLINE
    • NDLデジタルコレクション
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