純アルミニウムA1050のリン酸-硫酸系電解研磨における電解条件および後処理条件が表面構造と光沢度に及ぼす影響 純アルミニウムA1050のリン酸-硫酸系電解研磨における電解条件および後処理条件が表面構造と光沢度に及ぼす影響 Effects of Electropolishing and Posttreatment to Pure Aluminum A1050 for its Surface Structure and Specular Glossiness

著者

    • 中野, 信男

書誌事項

タイトル

純アルミニウムA1050のリン酸-硫酸系電解研磨における電解条件および後処理条件が表面構造と光沢度に及ぼす影響

タイトル別名

純アルミニウムA1050のリン酸-硫酸系電解研磨における電解条件および後処理条件が表面構造と光沢度に及ぼす影響

タイトル別名

Effects of Electropolishing and Posttreatment to Pure Aluminum A1050 for its Surface Structure and Specular Glossiness

著者名

中野, 信男

学位授与大学

新潟大学

取得学位

博士(工学)

学位授与番号

甲第3958号

学位授与年月日

2014-09-22

注記・抄録

収集根拠 : 博士論文(自動収集)

資料形態 : テキストデータ

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 博士論文

This study surveyed the amount of dissolved aluminum, reflectance of aluminum surfaces, and thicknesses of the anodic oxide films after electropolishing under conditions of several solution temperatures and current densities. Based on results obtained when phosphoric–sulfuric acids were used on pure aluminum A1050, we assessed electropolishing effects on surface structures and specular glosses. Results show the optimum conditions for electropolishing of pure aluminum: current density at 60 °C that is greater than 0.113 A/cm^2 and greater than 0.151 A/cm^2 at 80 °C. Moreover, electropolishing of pure aluminum with current density 0.151 A/cm^2 at 80 °C can provide flat, smooth surfaces having both high reflectance and specular gloss, creating almost no anodic film. However it is very difficult to make a complicated surface shape object smooth and glossy almost without porous anodic film by electropolishing. Therefore we think it effective that first a complicated surface shape object becomes smooth and glossy by electropolishing, but it gets to have thick porous anodic film. Afterward, this thick film can be removed by posttreatment. Thus this study also investigated specular glosses of aluminum surfaces, and thicknesses of the anodic oxide films after posttreatment of electropolishing under conditions of several posttreatment solution temperatures. Based on results obtained when hydrofluoric acid were used on pure aluminum A1050, we evaluated posttreatment effects on surface structures and specular glosses. Results show posttreatment with temperature of electrolyte 10 °C in the dipping time of 15 seconds can provide flat, smooth surfaces having higher gloss, creating almost no anodic film in comparison with the case of only electropolishing.Moreover, posttreatment with temperature of electrolyte 30 °C in the dipping time of 15 seconds can produce smooth surfaces having high gloss, creating completely no porous anodic film.

学位の種類: 博士(工学). 報告番号: 甲第3958号. 学位記番号: 新大院博(工)甲第411号. 学位授与年月日: 平成26年9月22日

新大院博(工)甲第411号

開始ページ : 1

終了ページ : 50

9アクセス

各種コード

  • NII論文ID(NAID)
    500001912240
  • NII著者ID(NRID)
    • 8000002472673
  • 本文言語コード
    • jpn
  • データ提供元
    • 機関リポジトリ
    • NDLデジタルコレクション
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