Chemical Vapor Deposition of Al_2O_3 Thin Films under Reduced Pressures

• SARAIE J.

Journal

• J. Electrochem. Soc.

  J. Electrochem. Soc. 132 890-892, 1985

Details

• CRID: 1572261551561585664
• NII Article ID: 80002405207
• Data Source:
  • CiNii Articles