Silicide formation and silicide-mediated crystallization of nickel-implanted amorphous silicon thin films
収録刊行物
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- J. Appl. Phys.
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J. Appl. Phys. 73 (12), 8279-8289, 1993
J. Appl. Phys. 73 (12), 8279-8289, 1993