Compositional and Electronic Properties of Chemical Vapor Deposited Y_2O_3 Thin Film-Si(100) Interfaces

Author(s)

Journal

  • Journal of Applied Physics

    Journal of Applied Physics 74(11), 6691, 1993

Cited by:  1

Codes

  • NII Article ID (NAID)
    80007370644
  • Article Type
    Journal Article
  • Data Source
    CJPref 
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