Simulation of anisotropic chemical etching of crystalline silicon using a cellular automata model

Author(s)

Journal

  • Sensors and Actuators

    Sensors and Actuators A-45, 885-889, 1994

Cited by:  5

Codes

  • NII Article ID (NAID)
    80007894325
  • Article Type
    Journal Article
  • Data Source
    CJPref 
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