Raman Scattering Spectroscopy of Structure of Amorphous Carbon Nitride Films.

• Ohkawara Yoshiaki

  Department of Chemistry, Nagaoka University of Technology

• Akasaka Hiroki

  Department of Chemistry, Nagaoka University of Technology

• Namiki Kei-ichi C.

  Department of Chemistry, Nagaoka University of Technology

• Ohshio Shigeo

  Department of Chemistry, Nagaoka University of Technology

• Ito Haruhiko

  Department of Chemistry, Nagaoka University of Technology

• Saitoh Hidetoshi

  Department of Chemistry, Nagaoka University of Technology

抄録

Amorphous carbon nitride (a-CN_x), films without hydrogen were deposited with dehydrated cyanogen bromide using electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition. The structure of the a-CN_x films was evaluated using a new Raman-active band at ∼1300 cm⁻¹, corresponding to sp³-hybridized carbon nitride. The Raman-active scattering band at ∼1300 cm⁻¹ became clearer with increasing hardness value of the films, suggesting that the hardness of the a-CN_x films increases with extension of the three-dimensional structure of the films composed of C–N bonds.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 42 (1), 254-258, 2003

  The Japan Society of Applied Physics

キーワード

• carbon nitride
• ECR
• chemical vapor deposition
• nano-indentation
• IR spectroscopy
• Raman scattering spectroscopy
• hardness

詳細情報

• CRID: 1390282681232972032
• NII論文ID: 80015859078
• NII論文ID: 130004764382
• NII書誌ID: AA10457675
• DOI: 10.1143/jjap.42.254
• ISSN: 13474065
• ISSN: 00214922
• NDL書誌ID: 6441343
• Web Site: http://id.ndl.go.jp/bib/6441343
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6441343
• Web Site: http://stacks.iop.org/1347-4065/42/i=1R/a=254/pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可