Ion extraction from carbon shunting arc plasma

• Takaki, K.

• Mukaigawa, S.

• Fujiwara, T.

• Kumagai, M.

• Yukimura, K.

抄録

The ion current characteristics of the shunting arc discharge are described in this letter. A carbon rod with 2 mm diameter and 40 mm length was employed for arc generation. The combination of the shunting arc and the negative pulse voltage applied to target is promising for plasma-based ion implantation and deposition for metallic or semimetallic three-dimensional materials. The delay time, which is defined as the time between the start of the arc current and applying the pulse voltage, was varied. The ions are extracted from the shunting arc plasma by applying a pulsed bias voltage to a target set nearby the arc source. The arc current lasts 40 μs, of which peak is 1.7 kA. The extracted target current has a sharp peak at the initial stage, followed by a stationary state. The stationary current decreases with increasing the delay time and increases with increasing the bias voltage. Under the assumption of a collisionless ion sheath, the plasma density was estimated. At the boundary between the ion sheath and the shunting arc plasma, the density was approximately 5×108 cm−3 and 3×107 cm−3 for the delay times of 100 and 1000 μs, respectively. The stationary ion current linearly increases with increasing the bias voltage and can be expressed in a simple equation.

収録刊行物

• Applied Physics Letters

  Applied Physics Letters 82 (16), 2583-2585, 2003-04-01

  American Institute of Physics

キーワード

• carbon
• plasma density
• arcs (electric)
• plasma immersion ion implantation
• plasma deposition
• plasma production
• plasma sheaths
• plasma transport processes

詳細情報

• CRID: 1050001202674030080
• NII論文ID: 80015887016
• ISSN: 00036951
• Web Site: https://iwate-u.repo.nii.ac.jp/records/10241
• 資料種別: journal article
• データソース種別:
  • IRDB
  • CiNii Articles
  • KAKEN