Pulsed-Source MOCVD of High-k Dielectric Thin Films with in situ Monitoring by Spectroscopic Ellipsometry

• Yoshishige Tsuchiya

• Masato Endoh

• Masatoshi Kurosawa

Bibliographic Information

Other Title

• Pulsed Source MOCVD of High k Dielectric Thin Films with in situ Monitoring by Spectroscopic Ellipsometry
• Special Issue: Solid State Devices & Materials
• Special Issue Solid State Devices Materials

Abstract

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Journal

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 42 (4B), 1957-1961, 2003-04

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

Keywords

• high-k dielectric thin film
• pulsed-source MOCVD
• in situ monitoring of film growth
• spectroscopic ellipsometry

Details

• CRID: 1520572359406932352
• NII Article ID: 80015977591
• NII Book ID: AA10457675
• ISSN: 00214922
• NDL BIB ID: 6523197
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6523197
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles