Plasma etching in semiconductor fabrication

Author(s)

• Morgan, Russ A.

Bibliographic Information

Plasma etching in semiconductor fabrication

Russ A. Morgan

（Plasma technology, 1）

Elsevier, c1985

Note

Includes bibliographical references and index

Details

• NCID: BA00003964
• ISBN:
  • 0444424199
• LCCN: 85004392
• Country Code: ne
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Amsterdam ; Tokyo
• Pages/Volumes: 318 p
• Size: 25 cm
• Classification:
  • LCC : TK7871.85
  • DC19 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductors -- Etching
  • LCSH : Plasma etching
• Parent Bibliography ID:
  • BA00003975