Dry etching for microelectronics

Author(s)

• Powell, Ronald A.

Bibliographic Information

Dry etching for microelectronics

edited by Ronald A. Powell

（Materials processing, theory and practices, v. 4）

North-Holland , Distributors for the USA and Canada, Elsevier Science Pub. Co., 1984

Note

Bibliography: p. 223-294

Includes index

Details

• NCID: BA00157673
• ISBN:
  • 0444869050
• LCCN: 84001145
• Country Code: ne
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Amsterdam ; Tokyo,New York, N.Y.
• Pages/Volumes: xi, 299 p.
• Size: 24 cm
• Classification:
  • LCC : TK7871.85
  • DC : 621.381/73
• Subject Headings:
  • LCSH : Semiconductors -- Etching
  • LCSH : Plasma etching
• Parent Bibliography ID:
  • BA00157684