Amorphous semiconductor technologies & devices
著者
書誌事項
Amorphous semiconductor technologies & devices
(Japan annual reviews in electronics, computers & telecommunications, 6,
OHM , North-Holland, 1981-
- 1982
- 1983(OHM)
- 1984(OHM)
- 1984(North-Holland)
- [1987](OHM)
- [1987](North-Holland)
大学図書館所蔵 全58件
  青森
  岩手
  宮城
  秋田
  山形
  福島
  茨城
  栃木
  群馬
  埼玉
  千葉
  東京
  神奈川
  新潟
  富山
  石川
  福井
  山梨
  長野
  岐阜
  静岡
  愛知
  三重
  滋賀
  京都
  大阪
  兵庫
  奈良
  和歌山
  鳥取
  島根
  岡山
  広島
  山口
  徳島
  香川
  愛媛
  高知
  福岡
  佐賀
  長崎
  熊本
  大分
  宮崎
  鹿児島
  沖縄
  韓国
  中国
  タイ
  イギリス
  ドイツ
  スイス
  フランス
  ベルギー
  オランダ
  スウェーデン
  ノルウェー
  アメリカ
注記
1983: v. 6, 1984: v. 16
v. 22: description of 1987 is not in the source
内容説明・目次
内容説明
The introduction to this volume presents an overview of the recent significant progress in the field of amorphous silicon and its alloys, demonstrating the strong potential need for a low-cost solar cell in the photovoltaic project and other new application fields. Characteristic features such as new electronic material are analyzed, and the prospects of remarkable growth and application fields are discussed, together with other topics in this rapidly expanding field. The second chapter reviews several topics in the field of basic physics, where integrations of various kinds of measurement data on the gap and tail states in a-Si by ICTS and DLTS have made it possible to model them numerically and to compare the results with theoretical calculation. Emphasis is placed on the effect of dangling bond termination by monovalent atoms, impurity processes in a-Si, and NMR and ENDOR studies. In chapter 3 a review is given of new aspects of film preparation technologies and their growth kinetics, especially high-deposition-rate processing and photo-CVD. Recent topics on amorphous silicon alloys and c(micro-crystalline)-Si film growth technologies are also reviewed.
目次
- Introduction (Y. Hamakawa). Some Topics in the Basic Physics (M. Kikuchi
- K. Takeda, N. Matsumoto
- T. Uda
- S. Yamasaki et al.
- F. Yonezawa). New Aspects of Preparations and Growth Kinetics (N. Fukuda
- M. Hanabusa
- A. Matsuda
- I. Shimizu). Device Physics (M. Hirose, S. Miyazaki
- H. Okamoto, H. Kida, Y. Hamakawa
- H. Okushi, K. Tanaka
- T. Tsukada.) Amorphous Silicon Solar Cells (H. Iida, Y. Hayashi
- Y. Kuwano, S. Nakano
- H. Sakai
- Y. Tawada
- Y. Uchida
- Y. Yukimoto
- ). Amorphous Semiconductor Electronic Devices (K. Hori, S. Yanagisawa
- S. Morozumi
- K. Murase, M. Suzuki, K. Kurumada). Opto-Electronic Applications of Amorphous Semiconductors (S. Kaneko, F. Okumura
- D. Kruangam, H. Okamoto, Y. Hamakawa
- E. Maruyama).
「Nielsen BookData」 より