Microelectronics processing : inorganic materials characterization

著者

書誌事項

Microelectronics processing : inorganic materials characterization

Lawrence A. Casper, editor ; developed from a symposium sponsored by the Division of Industrial and Engineering Chemistry of the American Chemimcal Society

（ACS symposium series, 295）

American Chemical Society, 1986

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注記

Includes bibliographies and indexes

内容説明・目次

内容説明

Examines leading-edge developments in the field of materials development. Covers all major aspects of materials science, with applications to many high technology areas. Explores the role of chemistry in high-tech materials and their applications.

目次

  • Analytical Approaches and Expert Systems in the Characterization of Microelectronic Devices
  • Electrical Characterization of Semiconductor Materials and Devices
  • Dopant Profiles by the Spreading Resistance Technique
  • SEM Techniques for Characterization of Semiconductor Materials
  • Semiconductor Materials Defect Diagnostics for Submicron VLSI Technology
  • Applications of Secondary Ion Mass Spectroscopy to Characterization of Microelectronic Materials
  • Applications of Auger Electron Spectroscopy in Microelectronics
  • X-Ray Photoelectron Spectroscopy Applied to Microelectronic Materials
  • Application of Neutron Depth Profiling to Microelectronic Materials Processing
  • Thermal-Wave Measurement of Thin Film Thickness
  • Characterization of Materials, Thin Films, and Interfaces by Optical Reflectance and Ellipsometric Techniques
  • Measurement of the Oxygen and Carbon Content of Silicon Wafers by Fourier Transform Spectrophotometry
  • Application of the Raman Microprobe to Analytical Problems of Microelectronics
  • Characterization of GaAs by Magneto-Optical Photoluminescent Spectroscopy
  • Thermal-Wave Imaging in a Scanning Electron Microscope
  • Fourier Transform Mass Spectrometry in the Microelectronics Service Laboratory
  • Materials Characterization Using Elemental and Isotope Analysis by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
  • Activation Analysis of Electronics Materials
  • Trace Element Survey Analyses by Spark Source Mass Spectrography (SSMS)
  • Characterization of Components in Plasma Phosphorus Doped Oxides
  • Process Control of Vacuum-Deposited Nickel-Chromium for the Fabrication of Reproducible Thin Film Resistors
  • Characterization of Spin-On Glass Films as a Planarizing Dielectric
  • Effects of Various Chemistries on Silicon Wafer Cleaning
  • Monitoring of Particles in Gases Using a Laser Counter
  • Microelectronics Processing Problem Solving: The Synergism of Complementary Techniques

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