Microelectronics processing : inorganic materials characterization
著者
書誌事項
Microelectronics processing : inorganic materials characterization
(ACS symposium series, 295)
American Chemical Society, 1986
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注記
Includes bibliographies and indexes
内容説明・目次
内容説明
Examines leading-edge developments in the field of materials development. Covers all major aspects of materials science, with applications to many high technology areas. Explores the role of chemistry in high-tech materials and their applications.
目次
- Analytical Approaches and Expert Systems in the Characterization of Microelectronic Devices
- Electrical Characterization of Semiconductor Materials and Devices
- Dopant Profiles by the Spreading Resistance Technique
- SEM Techniques for Characterization of Semiconductor Materials
- Semiconductor Materials Defect Diagnostics for Submicron VLSI Technology
- Applications of Secondary Ion Mass Spectroscopy to Characterization of Microelectronic Materials
- Applications of Auger Electron Spectroscopy in Microelectronics
- X-Ray Photoelectron Spectroscopy Applied to Microelectronic Materials
- Application of Neutron Depth Profiling to Microelectronic Materials Processing
- Thermal-Wave Measurement of Thin Film Thickness
- Characterization of Materials, Thin Films, and Interfaces by Optical Reflectance and Ellipsometric Techniques
- Measurement of the Oxygen and Carbon Content of Silicon Wafers by Fourier Transform Spectrophotometry
- Application of the Raman Microprobe to Analytical Problems of Microelectronics
- Characterization of GaAs by Magneto-Optical Photoluminescent Spectroscopy
- Thermal-Wave Imaging in a Scanning Electron Microscope
- Fourier Transform Mass Spectrometry in the Microelectronics Service Laboratory
- Materials Characterization Using Elemental and Isotope Analysis by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
- Activation Analysis of Electronics Materials
- Trace Element Survey Analyses by Spark Source Mass Spectrography (SSMS)
- Characterization of Components in Plasma Phosphorus Doped Oxides
- Process Control of Vacuum-Deposited Nickel-Chromium for the Fabrication of Reproducible Thin Film Resistors
- Characterization of Spin-On Glass Films as a Planarizing Dielectric
- Effects of Various Chemistries on Silicon Wafer Cleaning
- Monitoring of Particles in Gases Using a Laser Counter
- Microelectronics Processing Problem Solving: The Synergism of Complementary Techniques
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