Integrated circuits : chemical and physical processing : developed from the winter symposium
著者
書誌事項
Integrated circuits : chemical and physical processing : developed from the winter symposium
（ACS symposium series, 290）
American Chemical Society, 1985
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注記
Includes bibliographies and indexes
内容説明・目次
内容説明
Explores the complex physical and chemical operations that are designed to build structures or modify properties of materials in very thin films. Covers fundamental phenomena occurring in unit processes used to manufacture integrated circuits. Examines the most significant fundamental manufacturing processes.
目次
- The Manufacture of Integrated Circuits
- Application of Three Fundamental Conservation Laws
- Silicon Oxidation
- Zone Refining of Low Prandtl Number Liquid Metals
- Research Opportunities in Resist Technology
- Modifications of Photoresists
- Developer Concentration Effects
- Molecular-Beam Epitaxy for Device Applications
- Ion-Implanted Integrated Circuits
- Plasma-Assisted Processing
- Oxides and Nitrides of Germanium
- Group III-IV Compound Optoelectronic Devices
- Advanced Device Isolation for VLSI
- Ternary Group III-V Semiconductor Materials
- Device-Quality Strained-Layer Superlattices Wafer Design and Characterization
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