Introduction to microlithography : theory, materials, and processing

Author(s)

• Thompson, L. F.
• Willson, C. G. (C. Grant)
• Bowden, M. J.
• American Chemical Society. Division of Polymeric Materials : Science and Engineering
• American Chemical Society. Meeting

Bibliographic Information

Introduction to microlithography : theory, materials, and processing

L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983

（ACS symposium series, 219）

The American Chemical Society, 1983

Note

Includes bibliographical references and index

Contents of Works

• An introduction to lithography / L.F. Thompson
• The lithographic process
• The physics / L.F. Thompson and M.J. Bowden
• Organic resist materials
• Theory and chemistry / C. Grant Willson
• Resist processing / L.F. Thompson and M.J. Bowden
• Plasma etching / J.A. Mucha and D.W. Hess
• Multi-layer resist systems / B.J. Lin

Details

• NCID: BA04572087
• ISBN:
  • 0841207755
• LCCN: 83005968
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Washington, D.C.
• Pages/Volumes: ix, 363 p.
• Size: 24 cm
• Classification:
  • LCC : TR940
  • DC19 : 686.2/315
  • NDLC : PE31
• Subject Headings:
  • LCSH : Microlithography -- Congresses
  • LCSH : Photoresists -- Congresses
  • LCSH : Plasma etching -- Congresses
• Parent Bibliography ID:
  • BA00073096