Semiconductor materials and process technology handbook : for very large scale integration (VLSI) and ultra large scale integration (ULSI)
著者
書誌事項
Semiconductor materials and process technology handbook : for very large scale integration (VLSI) and ultra large scale integration (ULSI)
（Materials science and process technology series）
Noyes Publications, c1988
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注記
Includes bibliographies and index
内容説明・目次
内容説明
This handbook is a broad review of semiconductor materials and process technology, with emphasis on very large-scale integration (VLSI) and ultra large scale integration (ULSI). The technology of integrated circuit (IC) processing is expanding so rapidly that it can be difficult for the scientist working in one area to keep abreast of developments in other areas of the field. This handbook solves this problem by bringing together "snapshots" of the various aspects of the technology.
目次
IntroductionSilicon Materials TechnologyThe Thermal Oxidation of Silicon and Other Semiconductor MaterialsChemical Vapor Deposition of Silicon and Its CompoundsChemical Etching and Slice Cleanup of SiliconPlasma Processing: Mechanisms and ApplicationsPhysical Vapor DepositionDiffusion and Ion Implantation in SiliconMicrolithography for VLSIMetallization for VLSI Interconnect and PackagingCharacterization of Semiconductor MaterialsReferencesIndex
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