Ionized-cluster beam deposition and epitaxy
Author(s)
Bibliographic Information
Ionized-cluster beam deposition and epitaxy
（Materials science and process technology series）
Noyes Publications, c1988
Available at / 2 libraries
-
No Libraries matched.
- Remove all filters.
Note
Bibliography: p. 218-228
Includes index
Description and Table of Contents
Description
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented in a single volume to give a coherent presentation to all those interested or working in the field. ICB processes are well characterized and reliable equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Table of Contents
Introduction to Ionized-Cluster BeamsThe Ionized-Cluster Beam Deposition SystemFormation and Characteristics of ClustersFilm Formation MechanismsProperties of ICB-Deposited FilmsICB and Sputter DepositionConclusionReferencesIndex
by "Nielsen BookData"