Applications of plasma processes to VLSI technology

Author(s)

• 菅野, 卓雄 スガノ, タクオ

Bibliographic Information

Applications of plasma processes to VLSI technology

edited by Takuo Sugano ; translated by Hyo-gun Kim

Wiley, c1985

Other Title

Handōtai purazuma purosesu gijutsu

Uniform Title

Handōtai purazuma purosesu gijutsu

Note

Translation of: Handōtai purazuma purosesu gijutsu

"A Wiley-Interscience publication."

Bibliography: p. 369-389

Includes index

Details

• NCID: BA0724373X
• ISBN:
  • 0471869600
• LCCN: 85003255
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Original Language Code: jpn
• Place of Publication: New York
• Pages/Volumes: xiv, 394 p.
• Size: 24 cm
• Classification:
  • LCC : TK7871.85
  • DC19 : 621.381/73
• Subject Headings:
  • LCSH : Semiconductors -- Etching
  • LCSH : Integrated circuits -- Very large scale integration -- Design and construction
  • LCSH : Plasma etching
  • LCSH : Vapor-plating