Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California

著者

• Giffin, James W.
• Ruff, Bruce
• Society of Photo-optical Instrumentation Engineers
• Northern California Microphotomask/Masking Working Group
• International Society for Hybrid Microelectronics

書誌事項

Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California

James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid Microelectronics

（Proceedings of the Society of Photo-Optical Instrumentation Engineers, v. 100）

SPIE, c1977

注記

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA07255091
• ISBN:
  • 0892521279
• LCCN: 77154295
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: viii, 176 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC : 621.381/74
• 件名:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0118856X