Glow-discharge hydrogenated amorphous silicon

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書誌事項

Glow-discharge hydrogenated amorphous silicon

edited by K. Tanaka

（Advances in solid state technology）

KTK Scientific , Kluwer Academic, c1989

  • : U.S.

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内容説明

A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin

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