Microelectronics processing : chemical engineering aspects

書誌事項

Microelectronics processing : chemical engineering aspects

Dennis W. Hess, editor, Klavs F. Jensen, editor

(Advances in chemistry series, 221)

American Chemical Society, c1989

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注記

Includes bibliographical references and indexes

内容説明・目次

内容説明

Although chemical engineering principles are at the heart of solid state process technology, until now no reference volume addressing this relationship was available. This is the first book of its kind to tie fundamental engineering concepts to solid state process technology. Discussing the basic concepts involved-liquid-phase epitaxy, physical and chemical vapor deposition, diffusion and oxidation in silicon, resists in microlithography, etc.-this volume will be particularly useful in chemical engineering courses. It offers a framework within which specialized courses in microelectronics processing can be organized. In addition, it serves as a valuable reference source for all industrial engineers working with the individual process steps covered.

目次

  • Microelectronics Processing
  • Theory of Transport Processes in Semiconductor Crystal Growth from the Melt
  • Liquid-Phase Epitaxy and Phase Diagrams of Compound Semiconductors
  • Physical Vapor Deposition Reactors
  • Chemical Vapor Deposition
  • Diffusion and Oxidation of Silicon
  • Resists in Microlithography
  • Plasma-Enhanced Etching and Deposition
  • Interconnection and Packaging of High-Performance Integrated Circuits
  • Semiconductor Processing Problems Solved by Wet (Solution) Chemistry

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