Beam processing and laser chemistry : proceedings of Symposium D on Beam Processing and Laser Chemistry of the 1989 E-MRS spring conference, Strasbourg, France, 30 May-2 June 1989
著者
書誌事項
Beam processing and laser chemistry : proceedings of Symposium D on Beam Processing and Laser Chemistry of the 1989 E-MRS spring conference, Strasbourg, France, 30 May-2 June 1989
（European Materials Research Society symposia proceedings, v. 12）
North-Holland , Sole distributor for the USA and Canada, Elsevier Science Pub. Co., 1989
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注記
Includes bibliographical references
"Applied surface science. v. 43"
内容説明・目次
内容説明
This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field. A selection of contents: Deposition. Photo-assisted MOVPE growth of calcium fluoride (K.J. Mackey et al.). XPS characterization of chromium films deposited from Cr(CO) 6 at 248 nm (R. Nowak et al.). The chemistry of alkyl - aluminum compounds during laser-assisted chemical vapor deposition (G.S. Higashi). Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. (E. Boch et al.).
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