Advances in resist technology and processing V : 29 February-2 March, 1988, Santa Clara, California

Author(s)

• MacDonald, Scott A.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Advances in resist technology and processing V : 29 February-2 March, 1988, Santa Clara, California

Scott A. MacDonald, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 920）

International Society for Optical Engineering, 1988

• pbk.

Note

Includes bibliographies and index

• NCID: BA07915350
• ISBN:
  • 0892529555
• LCCN: 88060780
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: viii, 449 p.
• Size: 28 cm
• Classification:
  • LCC : TR940
  • DC19 : 686.2/325
• Subject Headings:
  • LCSH : Photoresists -- Congresses
• Parent Bibliography ID:
  • BA0022700X