Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California

著者

• Yanof, Arnold W.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California

Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 923）

The Society, c1988

• pbk.

注記

Includes bibliographies and index

詳細情報

• NII書誌ID(NCID): BA07915758
• ISBN:
  • 089252958X
• LCCN: 88060782
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vi, 307 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC19 : 621.381/73
• 件名:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• 親書誌ID:
  • BA0022700X