Fundamentals of microelectronics processing

Author(s)

Bibliographic Information

Fundamentals of microelectronics processing

Hong H. Lee

(McGraw-Hill chemical engineering series)

McGraw-Hill, c1990

  • pbk.

Available at  / 16 libraries

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Note

Includes bibliographies and index

Description and Table of Contents

Description

This new text introduces the material of each process type by explaining the underlying chemical engineering (and physical) principles. For microelectronic processing courses the text progresses from an overview of microelectronics processing through a logically-sequenced discussion of the processes leading to integrated circuits. The author is very careful to define terms that may be unfamiliar to chemical engineers, to provide numerous examples to aid in their understanding, and to include ample end-of-chapter problems.

Table of Contents

Integrated Circuits and Fabrication. Silicon Refining and Other Raw Materials. Bulk Crystal Growth. Electrical Properties of Processes Materials. Chemical Rate Processes and Kinetics. Chemical Vapour Deposition Reactors. Incorporation and Transport of Dopants. Pattern Generation, Transfer, and Delineation. Physical and Physico-Chemical Rate Processes. Physical Vapour Deposition Apparatuses and Plasma Reactors. Packaging.

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