書誌事項

Surface contamination : genesis, detection, and control

edited by K. L. Mittal

Plenum Press, c1979

  • v. 1
  • v. 2

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注記

Proceedings of a symposium held at the fourth International Symposium on Contamination Control in Washington, D.C., on Sept. 10-14, 1978, sponsored by the Institute of Environmental Sciences and the International Committee of Contamination Control Societies

Includes bibliographical references and indexes

内容説明・目次

内容説明

The present volume and its companion Volume 2 document the proceedings of the Symposium on Surface Contamination: Its Genesis, Detection and Control held in Washington, D.C., September 10-13, 1978. This Symposium was a part of the 4th International Symposium on Contamination Control held under the auspices of the International Committee of Contamination Control Societies, and the Institute of Environmental Sciences (U.S.A.) was the official host. The ubiquitous nature of surface contamination causes concern to everyone dealing with surfaces, and the world of surfaces is wide and open-ended. The technological areas where surface clean- ing is of cardinal importance are too many and very diversified. To people working in areas such as adhesion, composites, adsorp- tion, friction, lubrication, soldering,device fabrication, printed circuit boards, etc., surface contamination has always been a bete noire. In short, people dealing with surfaces are afflicted with molysmophobiat, and rightfully so. In the past, the subject of surface contamination had been discussed in various meetings, but this symposium was hailed as the most comprehensive symposium ever held on this important topic, as the technical program comprised 70 papers by more than 100 authors from 10 countries. The symposium was truly international in scope and spirits and was very well attended. The attendees represented a broad spectrum of backgrounds, interests, and pro- fessional affiliations, but all had a common interest and concern about surface contamination and cleaning.

目次

of Volume 1.- I. General Papers.- Surface Contamination: An Overview.- Relationship Between Surface Energy and Surface Contamination.- Investigation of the Interaction of Certain Low Energy Liquids with Polytetrafluoroethylene and Its Implications, in the Contamination of Polymeric Surfaces.- A Study of the Effects of Relative Humidity on Small Particle Adhesion to Surfaces.- Particulate Removal in Microelectronics Manufacturing.- Electrostatic Effects in the Adhesion of Powder Layers.- Causes and Cures of Dirty Windows.- Surface Contamination by Ion Bombardment.- Surface Contamination and Corrosion in Pyrotechnic Actuators.- Decomposition of Hydrogen Peroxide Cleaning Solutions by Selectively Plated Leadframes and Its Implications with Respect to Circuit Yield.- Ellipsometric Observations of Aluminium Hydroxide Films Grown in Water Vapor.- Contamination on Zinc and Aluminum Surfaces After Extended Urban Exposures.- 238PuO2 Surface Contamination of Radioisotopic Heat Sources.- Microbial Contamination of Surfaces.- Surface Cleaning in Thin Film Technology.- II. Cleaning of Surfaces.- UV/Ozone Cleaning of Surfaces: A Review.- Plasma Cleaning of Surfaces.- Surface Contamination Removal from Solid State Devices by Dry Chemical Processing.- Surface Cleaning by Low-Temperature Bombardment with Hydrogen Particles: An AES Investigation on Copper and Fe-Cr-Ni Steel Surfaces.- Some Promising Applications of Ion Milling in Surface Cleaning.- Glass Cleaning and Characterization of Cleanliness.- A Systematic Approach to Glass Cleaning.- Techniques for Removing Contaminants from Optical Surfaces.- Cleaning of Polymer Surfaces.- Removal of Fluid Contaminants by Surface Chemical Displacement.- Cleaning Issues Related to Soldering.- Nonionic Contamination Prevention - The Next Step Toward Guaranteed Printed Wiring Assembly Reliability.- Techniques for Removing Surface Contaminants in Thin Film Deposition.- Cleaning and Surface Preparation Technology and Other Factors Related to Coatings Produced by Flame Spraying.- Contaminated Concrete Surface Layer Removal.- Preparation and Characterization of Clean Mineral Surfaces.- The Preparation of Clean Water Surfaces for Fluid Mechanics.- Techniques to Obtain Atomically Clean Surfaces.- About the Contributors.

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詳細情報

  • NII書誌ID(NCID)
    BA09956596
  • ISBN
    • 0306401762
    • 0306401770
  • LCCN
    79015433
  • 出版国コード
    us
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    New York
  • ページ数/冊数
    2 v. (xvi, 1056 p.)
  • 大きさ
    26 cm
  • 分類
  • 件名
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