Secondary ion mass spectrometry : a practical handbook for depth profiling and bulk impurity analysis
著者
書誌事項
Secondary ion mass spectrometry : a practical handbook for depth profiling and bulk impurity analysis
Wiley, c1989
大学図書館所蔵 全12件
注記
"A Wiley-Interscience publication"
Includes bibliographical references
内容説明・目次
内容説明
Seco ndary Ion Mass Spectrometry Basic Concepts, Instrumental Aspects, Applications and Trends (Volume 86 in Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications) A. Benninghoven, F. G. Rudenauer, and H. W. Werner "[This book] is (and probably will be for a long time ahead) the standard book on secondary ion mass spectrometry." - Trends in Analytical Chemistry "This is a monumental work, and contains nearly 600 illustrations and over 2,000 references covering nearly all the essential published information up to 1985. The book will certainly find its place as a reference work in most laboratories using this methodology" - Analytica Chimica Acta 1987 (0 471-01056-1) 1,227 pp. Secondary Ion Mass Spectrometry Proceedings of the Sixth International Conference on Secondary Ion Mass Spectrometry (SIMS VI) Edited by A. Benninghoven, A.M. Huber, and H. W. Werner "The international SIMS conferences have been held every two years since 1977.
They are recognized as one of the major forums for scientists, instrument manufacturers, and other researchers actively engaged in this rapidly expanding field this volume is a valuable account of the latest advances in the field of SIMS, and of the research trends of some of the most respected experts in the field. it is recommended for the libraries of all academic and industrial institutions where SIMS research is ongoing. it should prove a valuable reference source for years to come." - Applied Spectroscopy 1988 (0 471-91832-6) 1,078 pp.
目次
ANALYSIS CONDITIONS. Primary Beam. Primary Beam Energy. Angle of Incidence. Sputtering Rate. Detected Area. Species Monitored. End Point. Energy Distribution. PROFILE ISSUES. Ion Beam Mixing and Depth Resolution. Segregation and Charge Driven Diffusion. Matrix Effects. Surface Effects. Particulates. Crate Shape. Microtopography. Memory Effect. Count Rate Saturation. Sample Location and Mounting. Mass Interferences. QUANTIFICATION. Procedure. Calibration Using Ion Implantation. Systematic Trends in RSFs. SPECIFIC APPLICATIONS. Bulk Analysis. Metals and Rough Surfaces. Insulators. Interfaces. Multilayers. Residual Gas Elements. Small Areas. Major Elements. Appendices. Index.
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