Monitoring and control of plasma-enhanced processing of semiconductors : proceedings : 1-2 November 1988, Santa Clara, California

Author(s)

• Griffiths, James E.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Monitoring and control of plasma-enhanced processing of semiconductors : proceedings : 1-2 November 1988, Santa Clara, California

James E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1037）

SPIE, c1989

Note

Includes bibliographical references

Details

• NCID: BA10622747
• ISBN:
  • 0819400726
• LCCN: 88063652
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: viii, 147 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• Subject Headings:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Plasma engineering -- Congresses
  • LCSH : Epitaxy -- Congresses
  • LCSH : Vapor plating -- Congresses
• Parent Bibliography ID:
  • BA0022700X