Monitoring and control of plasma-enhanced processing of semiconductors : proceedings : 1-2 November 1988, Santa Clara, California

著者

• Griffiths, James E.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Monitoring and control of plasma-enhanced processing of semiconductors : proceedings : 1-2 November 1988, Santa Clara, California

James E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1037）

SPIE, c1989

注記

Includes bibliographical references

• NII書誌ID(NCID): BA10622747
• ISBN:
  • 0819400726
• LCCN: 88063652
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: viii, 147 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• 件名:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Plasma engineering -- Congresses
  • LCSH : Epitaxy -- Congresses
  • LCSH : Vapor plating -- Congresses
• 親書誌ID:
  • BA0022700X