Semiconductor material and device characterization

著者

• Schroder, Dieter K.

書誌事項

Semiconductor material and device characterization

Dieter K. Schroder

Wiley, c1990

注記

"A Wiley-Interscience publication."

Includes bibliographical references and index

内容説明・目次

内容説明

This detailed sourcebook provides an up-to-date description and unified treatment of the characterization techniques used in the semiconductor industry. It covers electrical, optical, electron- beam, ion-beam, X-ray and gamma ray methods. This information, until now scattered in journals and review papers, is presented in a unified manner with over 1300 references. It is also a valuable reference book on characterization methods.

目次

• Resistivity
• Carrier and Doping Concentration
• Contact Resistance and Schottky Barrier Height
• Series Resistance, Channel Length, Threshold Voltage
• Mobility
• Oxide and Interface Trapped Charge
• Deep-Level Impurities
• Carrier Lifetime
• Optical Characterization
• Chemical and Physical Characterization
• Appendixes
• Index.

「Nielsen BookData」 より

• NII書誌ID(NCID): BA10754759
• ISBN:
  • 0471511048
• LCCN: 89024881
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: New York
• ページ数/冊数: xv, 599 p.
• 大きさ: 25 cm
• 分類:
  • LCC : QC611
  • DC20 : 621.381/52
• 件名:
  • LCSH : Semiconductors
  • LCSH : Semiconductors -- Testing